Key Ion Implantation Material for High-process Integrated Circuit

• Product abundance:Ge-72>56.00%
• Product purity: 99.99%
• Product Form: Germanium Tetrafluoride

Germanium-72 is the main material used in the fabrication of nanoscale chips and germanium-72 tetrafluoride gas is used in the preamorphization injection process to optimize the performance and speed of the devices.

Natural germanium (Ge) has five stable isotopes, among which germanium 72 is widely used in the semiconductor manufacturing industry. High-abundance germanium 72 is used in the pre-amorphization implantation process in the form of germanium tetrafluoride gas, which can prevent silicon wafers from being implanted into dopant channels, optimize device performance and speed, eliminate channel effects, and enhance the device performance of P-type metal oxide semiconductor field effect transistors.

Please let me know if you need me.

Email:

Lucas Gao

[email protected]

Wayne Tang

[email protected]